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非对称异质双栅应变硅MOSFETs 二维模型研究
引用本文:李劲,刘红侠,袁博,曹磊,李斌.非对称异质双栅应变硅MOSFETs 二维模型研究[J].半导体学报,2011,32(4):044005-7.
作者姓名:李劲  刘红侠  袁博  曹磊  李斌
作者单位:西安电子科技大学
摘    要:基于对二维泊松方程的精确求解,本文对全耗尽型非对称异质双栅应变硅MOSFET的二维表面势,表面电场,阈值电压进行了研究。模型结果和二维数值模拟器的结果很吻合。此外并对该器件的物理作了深入的研究。该模型对设计全耗尽型非对称异质双栅应变硅MOSFET器件有着重要的指导作用.

关 键 词:MOSFET  解析模型  二维分析  非对称  全耗尽  应变硅  双栅  料门
收稿时间:2010/9/26 0:00:00
修稿时间:11/5/2010 1:14:39 PM

A two-dimensional analytical model of fully depleted asymmetrical dual material gate double-gate strained-Si MOSFETs
Li Jin,Liu Hongxi,Yuan Bo,Cao Lei and Li Bin.A two-dimensional analytical model of fully depleted asymmetrical dual material gate double-gate strained-Si MOSFETs[J].Chinese Journal of Semiconductors,2011,32(4):044005-7.
Authors:Li Jin  Liu Hongxi  Yuan Bo  Cao Lei and Li Bin
Affiliation:[1]Key Laboratory of Ministry of Education for Wide Bandgap Semiconductor Devices, School of Microelectronics,Xidian University, Xi'an 710071, China [2]School of Information and Electrical Engineering, Hunan University of Science and Technology, Xiangtan 411201, China
Abstract:On the basis of the exact resultant solution of two dimensional Poisson's equations, a new accurate two-dimensional analytical model comprising surface channel potentials, a surface channel electric field and a threshold voltage for fully depleted asymmetrical dual material gate double-gate strained-Si MOSFETs is successfully developed. The model shows its validity by good agreement with the simulated results from a two-dimensional numerical simulator. Besides offering a physical insight into device physics, the model provides basic design guidance for fully depleted asymmetrical dual material gate double-gate strained-Si MOSFETs.
Keywords:dual material gate  double-gate MOSFET  strained-Si  short-channel effect  the drain-induced barrier-lowering
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