栅槽横向宽度对InAlAs/InGaAs HEMTsDC及RF特性的影响

我们制造出了栅长为88 nm的InP基InAlAs/InGaAs 高电子迁移率器件(HEMTs),该器件的频率特性为ft = 100 GHz, fmax = 185 GHz。本文对横向栅槽宽度分别为300 nm, 412 nm, 1070 nm的器件进行了实验。借助能带图的方式,定性分析了横向栅宽的增加会因为表面态和碰撞电离的作用,使得器件直流特性表现出kink效应,并得到减小横向栅槽宽度能减弱kink效应的结论,文中还讨论了横向栅槽宽度通过改变器件寄生电容及其源漏电阻,从而对频率特性产生影响。这些分析对制造出更高性能的HEMT器件有比较重要的意义。

Impact of the lateral width of the gate recess on the DC and RF characteristics of InAlAs/InGaAs HEMTs

We fabricated 88 nm gate-length InP-based InAlAs/InGaAs high electron mobility transistors (HEMTs) with a current gain cutoff frequency of 100 GHz and a maximum oscillation frequency of 185 GHz. The characteristics of HEMTs with side-etched region lengths (L_side) of 300, 412 and 1070 nm were analyzed. With the increase in L_side, the kink effect became notable in the DC characteristics, which resulted from the surface state and the effect of impact ionization. The kink effect was qualitatively explained through energy band diagrams, and then eased off by reducing the L_side. Meanwhile, the L_side dependence of the radio frequency characteristics, which were influenced by the parasitic capacitance, as well as the parasitic resistance of the source and drain, was studied. This work will be of great importance in fabricating high-performance InP HEMTs.