| As2S8平面波导：退火-光照-退火循环作用下折射率的变化及光传输特性 |
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| 引用本文： | 邹林儿,王国日,沈云,陈抱雪,矶守.As2S8平面波导：退火-光照-退火循环作用下折射率的变化及光传输特性[J].半导体学报,2011,32(11):112004-6. |
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| 作者姓名： | 邹林儿 王国日 沈云 陈抱雪 矶守 |
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| 摘 要： | 蒸发沉积态的非晶半导体As2S8薄膜在退火-饱和光照-退火循环处理下,其折射率变化存在可逆。而对于在退火-非饱和光照-退火的连续处理,发现As2S8薄膜折射率先增加达到最大值,然后在退火作用下才出现可逆。退火处理引起S-S键态变化,导致非晶半导体As2S8薄膜结构达到一定稳定状态,伴随着薄膜厚度的减小。As2S8平面波导在130C 温度退火,然饱和光照,又经过130C 温度退火处理后,显示出约为0.27 dB/cm低的传输损耗,在波长632.8 nm导模下有良好的光传输性能。
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| 关 键 词： | 折射率变化 连续退火 平面波导 传播特性 火周期 辐照 非晶半导体薄膜 退火处理 |
| 收稿时间： | 4/23/2011 8:18:39 PM |
As2S8 planar waveguide: refractive index changes following an annealing and irradiation and annealing cycle, and light propagation features |
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| Zou Liner,Wang Gouri,Shen Yun,Chen Baoxue and Mamoru Iso.As2S8 planar waveguide: refractive index changes following an annealing and irradiation and annealing cycle, and light propagation features[J].Chinese Journal of Semiconductors,2011,32(11):112004-6. |
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| Authors: | Zou Liner Wang Gouri Shen Yun Chen Baoxue and Mamoru Iso |
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| Affiliation: | Department of Physics, Nanchang University, Nanchang 330031, China;Department of Physics, Nanchang University, Nanchang 330031, China;Department of Physics, Nanchang University, Nanchang 330031, China;School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Department of Chemical Engineering, Tokyo University of Agriculture and Technology, Tokyo 184-8588, Japan |
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| Abstract: | |
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| Keywords: | amorphous semiconductor chalcogenide As2S8 waveguide refractive index light propagation |
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