新的非平面Flash Memory结构

提出了一种为在低压下工作的具有较快编程速度的新的非平面的flash memory单元结构,该结构采用简单的叠栅结构并只需增加一步光刻制做出这一新的沟道结构.对于栅长为1.2μm flash单元,获得了在Vg＝15V,Vd＝5V条件下编程时间为42μs,在Vg＝-5V,Vs＝8V条件下的擦除时间为24ms的高性能flash单元,这一新结构的编程速度比普通平面型快闪存储器要快很多.这种新结构flash单元在高速应用场合下具有很好的应用前景.

A Novel Non-Planar Cell Structure for Flash Memory

Proposed herein is a novel non-planar cell structure for flash memory which has been fabricated to achieve high programming speed with low operating voltage.This memory cell preserves a simple stacked gate structure which only requires an additional masking step to form the novel structure in the channel.For the cell of the 1.2μm gate length,the programming speed of 43μs under the measuring condition of Vg=15V,Vd=5V,and the erasing time of 24ms under Vg=-5V,Vs=8V are obtained.The programming speed is faster than that of the conventional planar cell structure.This superior programming speed makes it suitable for high speed application.