| 脉冲激光沉积制备TiN/AlN多层薄膜的研究 |
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| 引用本文： | 唐普洪.脉冲激光沉积制备TiN/AlN多层薄膜的研究[J].光电子．激光,2010(6):880-885. |
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| 作者姓名： | 唐普洪 |
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| 作者单位： | 浙江工业大学机械制造及自动化教育部重点实验室;嘉兴职业技术学院; |
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| 基金项目： | 国家自然科学基金资助项目(50975259); 浙江省自然科学基金青年科技人才培养资助项目(R405031); 嘉兴市科技计划资助项目(2009AY2007) |
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| 摘 要： | 采用脉冲激光沉积(PLA)法,在单晶Si试样表面沉积制备了一系列TiN/AlN硬质多层膜,并采用基于免疫算法的免疫径向基函数(IRBF)神经网络对AlN厚度建立预测模型,设计出具有可控调制周期和调制比的TiN/AlN多层膜。X射线衍射(XRD)结果表明,小调制层周期下,过高或过低的工艺条件下薄膜通常为非晶态,适当的工艺条件下TiN、AlN形成具有强烈织构的超晶格柱状晶多层膜;与此相应,纳米多层膜产生了硬度和弹性模量异常增高;随着调制比增加,使纳米多层膜形成非晶AlN层和纳米晶TiN层的多层结构,多层膜的硬度和弹性模量逐渐下降。XPS结果表明,薄膜界面由Ti+4、Ti+3离子组成,N的负二价、三价亚谱结构预示着非当量TiN、AlN的形成。AFM研究显示,薄膜的调制周期均在10~200 nm范围内,且薄膜表面较均匀;当多层薄膜调制周期在50 nm以下时,薄膜的纳米硬度值明显高于TiN和AlN的混合硬度值,达30 Gpa。
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| 关 键 词： | 脉冲激光沉积(PLA) 多层膜 TiN/AlN 免疫径向基函数(IRBF) |
A study on TiN/AlN multilayer thin films prepared by pulsed laser ablation |
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| TANG Pu-hong.A study on TiN/AlN multilayer thin films prepared by pulsed laser ablation[J].Journal of Optoelectronics·laser,2010(6):880-885. |
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| Authors: | TANG Pu-hong |
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| Affiliation: | TANG Pu-hong1,2,SONG Ren-guo1,CHAI Guo-zhong1,WANG Dao-hong2,XIONG Jing-yuan1(1.Key Laboratory of Mechanical Manufacture and Automation,EMC,Zhejiang University of Technology,Hangzhou 310014,China,2.College of Jiaxing Vocational Technology,Jiaxing 314036,China) |
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| Abstract: | The TiN/AlN thin films are deposited on silicon substrate by pulsed laser ablation.By using the constructed neural network model,a multilayer struture with modulation period ranged from 10 to 200 nm is designed accurately.Both composition and structure of the films are analyzed by microhardness tester,SEM XPS and XRD.TiN film exhibits nanocrystalline columns,whereas AlN shows amphous state.The TiN/AlN multilayer presents microstructural features typical for both materials.The film hardness of 16.9 GPa for A... |
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| Keywords: | pulsed laser ablation(PLA) multilayer films TiN/AlN immune radial basis function(IRBF) |
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