| 基于Marangoni效应的光学元件化学抛光工艺研究 |
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| 引用本文： | 项震,聂传继,侯晶.基于Marangoni效应的光学元件化学抛光工艺研究[J].光电子．激光,2007,18(10):1158-1161. |
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| 作者姓名： | 项震 聂传继 侯晶 |
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| 作者单位： | 浙江大学现代光学仪器国家重点实验室,浙江,杭州,310027 |
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| 基金项目： | 国家自然科学基金资助项目（10476025） |
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| 摘 要： | 介绍了Marangoni界面效应及化学抛光反应机理,进行了数控抛光刻蚀实验研究,包括刻蚀稳定性实验、刻蚀量与刻蚀头速率的关系以及初步的面形修复加工.通过对实验结果进行分析,得到稳定可控刻蚀抛光的上限刻蚀速率和刻蚀效率与刻蚀头走速的函数关系.
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| 关 键 词： | Marangoni界面效应 化学抛光刻蚀 刻蚀函数 |
| 文章编号： | 1005-0086（2007）10-1158-04 |
| 修稿时间： | 2006-10-29 |
A Chemical Polish-etching of Optics Suface Based on the Marangoni Interface Effect |
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| XIANG Zhen,NIE Chuan-ji,HOU Jing.A Chemical Polish-etching of Optics Suface Based on the Marangoni Interface Effect[J].Journal of Optoelectronics·laser,2007,18(10):1158-1161. |
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| Authors: | XIANG Zhen NIE Chuan-ji HOU Jing |
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| Affiliation: | State Key Laboratory of Modem Optical Instrumentation,Zhejiang University, Hangzhou 310027 ,China |
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| Abstract: | We propose a chemical polish-etching of optics suface based on the Marangoni interface effect theory and experimental investigations. Marangoni interface effect and chemical polish-etching mechanism are presented,and experimental investigations of chemical polish-etching based on this effect under computer control are performed,including the experiments of etching stability and relationship between etching efficiency and velocity. We finished the primary polish-etch figuring optical surfaces with the device. The results are analyzed by the WKYO apparatus,and the etching function is given under a certain condition. |
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| Keywords: | Marangoni interface effect chemical polish etching etching function |
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