KrF脉冲激光退火制备锐钛矿TiO2薄膜

在常温下，用射频磁控溅射在石英衬底上沉积厚度约为200 nm 的TiO2薄膜，然后使用波长为248 nm 的KrF脉冲激光器，在不同功率密度下对薄膜样品进行辐照退火处理，并采用X射线衍射（XRD)、拉曼(Raman)、X射线电子能谱（XPS）、原子力显微镜(AFM)、扫描电子显微镜(SEM)、高分辨率扫描隧道显微镜（HRTEM）以及选择区域电子衍射（SAED）、紫外可见分光光度计等方法分析不同激光功率密度退火对TiO2薄膜的结构、表面形貌和透射率等性能的影响。结果表明当激光功率密度为0.5 J/cm2时，可获得高质量的锐钛矿TiO2薄膜，当继续增大光功率密度时，TiO2薄膜变为(1 1 0)取向的金红石相，其薄膜表面粗糙度也相应增大。

Fabrication of anatase TiO2 by KrF pulse laser annealing

TiO2 thin films of ~200 nm were prepared by RF magnetron sputtering on quartz substrates at room temperature, and then annealed by a KrF pulse laser with wavelength 248 nm under different power densities in the air. The effect of laser power density on the characteristics of films was systematically analyzed using X-ray diffractometry (XRD), Raman spectral, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atom force microscopy (AFM), High resolution transmission electron microscopy (HRTEM) and selected area electron diffraction (SAED) and UV-vis spectrophotometer. The results showed that high-quality anatase TiO2 films can be obtained when the power density was 0.5 J/cm2. By increasing the power density continually, TiO2 showed the predominant orientation with rutile phase along (1 1 0) reflection, with the roughness of the films increasing.