| 离子束刻蚀位相型Ronchi光栅研究 |
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| 引用本文： | 傅绍军,洪义麟,陶晓明,齐开国.离子束刻蚀位相型Ronchi光栅研究[J].量子电子学报,1995(2). |
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| 作者姓名： | 傅绍军 洪义麟 陶晓明 齐开国 |
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| 作者单位： | 中国科学技术大学国家同步辐射实验室，中国科学技术大学物理系 |
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| 摘 要： | 本文报道了采用紫外光刻和离子束刻蚀方法制作位相型Ｒｏｎｃｈｉ光栅的工艺技术，并对其衍射特性进行了讨论，同时给出实验结果。
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| 关 键 词： | 位相型Ronchi光栅，离子束刻蚀 |
Fabrication of Phase Ronchi Grating by ion Beam Etching |
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| Fu Shaojun, Hong Yilin, Tao Xiaoming.Fabrication of Phase Ronchi Grating by ion Beam Etching[J].Chinese Journal of Quantum Electronics,1995(2). |
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| Authors: | Fu Shaojun Hong Yilin Tao Xiaoming |
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| Abstract: | A phase Ronchi grating was fabricated by ultraviolet lithographing and ion beam etching. The experimental results of this grating with wavelength of 632.8 nm are given, and the diffraction characteristics of the Ronchi grating discllssed. |
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| Keywords: | phase Ronchi grating ion-beam etching |
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