首页 | 本学科首页   官方微博 | 高级检索  
     

SU-8胶双光子微加工分辨率与工艺条件研究
引用本文:宋旸,董贤子,赵震声,段宣明.SU-8胶双光子微加工分辨率与工艺条件研究[J].微纳电子技术,2011,48(1):40-45.
作者姓名:宋旸  董贤子  赵震声  段宣明
作者单位:1. 中国科学院理化技术研究所有机纳米光子学实验室,北京,100190;中国科学院研究生院,北京,100190
2. 中国科学院理化技术研究所有机纳米光子学实验室,北京,100190
基金项目:国家重点基础研究发展计划(973计划)资助项目(2010CB934103); 国家自然科学基金项目(50773091,60907019,50973126,61077028)
摘    要:为了提高SU-8光刻胶的微加工分辨率,利用飞秒激光双光子聚合技术研究了SU-8光刻胶微加工时的加工工艺条件与分辨率之间的关系.实验在本研究组自主研制的纳米光子学超细微加工系统上进行,以钛蓝宝石飞秒激光器发出的780 nm波长激光作为加工光源,考察了不同激光功率与曝光时间等激光加工条件和后烤与无后烤等工艺条件对SU-8聚...

关 键 词:双光子聚合  微加工  分辨率  SU-8光刻胶  飞秒激光

Resolution of SU-8 Photoresist in Two-Photon Polymerization Microfabrication and Research of Fabrication Conditions
Song Yang,Dong Xianzi,Zhao Zhensheng,Duan Xuanming.Resolution of SU-8 Photoresist in Two-Photon Polymerization Microfabrication and Research of Fabrication Conditions[J].Micronanoelectronic Technology,2011,48(1):40-45.
Authors:Song Yang  Dong Xianzi  Zhao Zhensheng  Duan Xuanming
Affiliation:Song Yang a,b,Dong Xianzi a,Zhao Zhensheng a,Duan Xuanming a (a.Laboratory of Organic Nanophotonics,Technical Institute of Physics and Chemistry,b.Graduate School,Chinese Academy of Sciences,Beijing 100190,China)
Abstract:In order to improve the microfabrication resolution of the SU-8 photoresist,the relationship between the fabrication conditions and resolution of the SU-8 photoresist was investigated by two-photon polymerization microfabrication technique.The two-photon polymerization experiments were performed on an own-made two-photon fabrication system through a Ti∶Sapphire femtosecond laser with the wavelength of 780 nm as the light source.The conditions inf-luences of the laser power,exposure time,post-baking and without post-baking on the profile and size of SU-8 polymer spots were studied.The minimum diameter of the fabricated dots is 0.22 μm on the condition of the post-baking process,but is 0.47 μm without the post-baking process.The experimental results show that the polymer spots with the smaller size can be achieved by the lower laser power and shorter exposure time,and the post-baking process is advantaged to reduce fabricating laser power and improve the resolution.The experimental results have a good agreement with the simulated analysis based on two-photon polymerization microfabrication theory.
Keywords:two-photon polymerization  microfabrication  resolution  SU-8 photoresist  femtosecond laser  
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号