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IC发展与基础材料
引用本文:曹宏斌.IC发展与基础材料[J].微纳电子技术,1997(6).
作者姓名:曹宏斌
作者单位:西安微电子技术研究所
摘    要:通过国内外电子基础材料(化学试剂、高纯气体、硅材料)的对比,论述了困扰我国集成电路产业高速、稳定、可靠发展等诸类因素,提出只有对超大规模集成电路所用的电子基础材料的微观结构进行高冒险、高投资的研究和开发,才能使我国IC产业稳定、高速的发展和腾飞

关 键 词:电子基础材料,集成电路

Integrated Circuits Development and Basic Materials
Abstract:This paper presents a contrast between basic electronic materials of our country and that of foreign countries (such as chemical reagent,high pure gas,Si material).It describes some factors perplexing high speed,steady,reliable development of integra ted circuits industry of our country and puts forward that only studying and exploring microconstruction of basic electronic materials used to VLSI with high risk and high investment then can vitalize IC industry of our country with steadily high speed.
Keywords:Basic electronic materials  IC
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