| 闪耀光栅制备工艺与结构保真性研究 |
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| 引用本文： | 孙国良,王海容,高鲜妮,蒋庄德.闪耀光栅制备工艺与结构保真性研究[J].压电与声光,2011,33(4). |
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| 作者姓名： | 孙国良 王海容 高鲜妮 蒋庄德 |
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| 作者单位： | 机械制造系统工程国家重点实验室,陕西西安710049;西安交通大学机械工程学院,陕西西安710049 |
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| 基金项目： | 国家高新技术“八六三”基金资助项目(2009AA04Z330); 新世纪优秀人才支持计划基金资助项目(NCET-10-0643); 国家自然科学基金资助项目(90923001) |
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| 摘 要： | 针对气体检测中分光应用的闪耀光栅,该文在硅片上制备聚甲基丙烯酸甲脂(PMMA)薄膜,采用热压印及后续工艺制备了硅基的聚甲基丙烯酸甲脂闪耀光栅,通过实验分析研究了复制闪耀光栅的保真特性。研究表明,通过聚甲基丙烯酸甲脂制备、热压印及后续工艺可得到具有高保真性的微闪耀光栅,而这种方法所获得的闪耀光栅与传统方法加工的闪耀光栅相比,在效率、成本方面均具有较明显的优势。
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| 关 键 词： | 热压印 闪耀光栅 制备工艺 聚甲基丙烯酸甲脂 结构保真性 |
Investigation on Fabrication Process and Structural Fidelity of the Flash Grating |
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| SUN Guoliang,WANG Hairong,GAO Xianni,JIANG Zhuangde.Investigation on Fabrication Process and Structural Fidelity of the Flash Grating[J].Piezoelectrics & Acoustooptics,2011,33(4). |
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| Authors: | SUN Guoliang WANG Hairong GAO Xianni JIANG Zhuangde |
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| Affiliation: | SUN Guoliang1,2,WANG Hairong1,GAO Xianni1,JIANG Zhuangde1,2(1.State Key Lab.for Manufacturing System Engineering,Xi'an 710049,China,2.College of Mechanical Engineering,Xi'an Jiaotong University,China) |
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| Abstract: | For the wavelength division applications to the gas measurement,the Si-based PMMA flash grating has been fabricated through preparing PMMA film on Si substrate by using the hot-embossing lithography(HEL) and the follow-up processes in this work.The fidelity of the duplicated flash grating has also been studied and analyzed by experiment.The results showed that the micro-flash grating with high fidelity could be obtained by preparing PMMA film and using the HEL as well as the follow-up processes.The reported... |
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| Keywords: | hot-embossing lithography flash grating fabrication process PMMA structural fidelity |
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