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ZnO薄膜体声波谐振器性能分析和研制
引用本文:汤亮,郝震宏,乔东海,汪承灏.ZnO薄膜体声波谐振器性能分析和研制[J].压电与声光,2008,30(4).
作者姓名:汤亮  郝震宏  乔东海  汪承灏
作者单位:中国科学院,声学研究所,声学微机电实验室,北京100080
摘    要:采用射频网络法分析了ZnO薄膜体声波谐振器的谐振特性,并考虑了介质声损耗对品质因数Q值的影响。采用硅体刻蚀工艺在硅基片上制备了以ZnO薄膜为压电膜的薄膜体声波谐振器,并对器件的性能进行了测试。将实验与理论分析结果进行对比,发现实验器件的谐振频率与理论值一致,但器件Q值却比理论值低,进一步的分析揭示了实际器件Q值偏低的原因。

关 键 词:滤波器  双工器  振荡器  射频微机电系统  薄膜体声波谐振器

Development and Analysis of a ZnO Film Bulk Acoustic Resonator
TANG Liang,HAO Zhen-hong,QIAO Dong-hai,WANG Cheng-hao.Development and Analysis of a ZnO Film Bulk Acoustic Resonator[J].Piezoelectrics & Acoustooptics,2008,30(4).
Authors:TANG Liang  HAO Zhen-hong  QIAO Dong-hai  WANG Cheng-hao
Abstract:Resonant properties of a ZnO film bulk acoustic resonator(FBAR) was analyzied based on RF network method.The attenuation of the acoustic media was also taken into account for Q evaluation.Some FBAR samples were developed by using micro-machining silicon processes.They were also tested and measured.It was found that the measured resonant frequencies were in agreement with the theoretical predictions,but the measured Q was much lower.Further investigations revealed the factors which could affect Q of the devices.
Keywords:filter  duplexer  oscillator  RF MEMS  FBAR
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