| 沉积电流对ZnO薄膜的结构和光学性质的影响 |
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| 引用本文： | 岳兰,郑毓峰,孙言飞.沉积电流对ZnO薄膜的结构和光学性质的影响[J].半导体光电,2007,28(1):83-86. |
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| 作者姓名： | 岳兰 郑毓峰 孙言飞 |
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| 作者单位： | 新疆大学,物理科学与技术学院功能材料研究室,新疆,乌鲁木齐,830046;新疆大学,物理科学与技术学院功能材料研究室,新疆,乌鲁木齐,830046;新疆大学,物理科学与技术学院功能材料研究室,新疆,乌鲁木齐,830046 |
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| 摘 要： | 采用阴极电沉积的方法在导电玻璃上制备了ZnO薄膜.研究了沉积电流对薄膜结构特性和光学特性的影响.XRD分析表明ZnO薄膜为纤锌矿结构,晶粒尺寸随电流的增大而增大,择优取向随电流的变化发生了转变.光学测试表明样品的透射率最大值可达84%,禁带宽度随电流变化不大,接近于3.3 eV.
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| 关 键 词： | 电沉积 ZnO XRD谱图 光学性质 |
| 文章编号： | 1001-5868(2007)01-0083-04 |
| 修稿时间： | 2006-05-29 |
Influence of Deposition Current on Structural and Optical Properties of ZnO Films |
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| YUE Lan,ZHENG Yu-feng,SUN Yan-fei.Influence of Deposition Current on Structural and Optical Properties of ZnO Films[J].Semiconductor Optoelectronics,2007,28(1):83-86. |
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| Authors: | YUE Lan ZHENG Yu-feng SUN Yan-fei |
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| Affiliation: | Department of Physics, Xinjiang University, Urumqi 830046, CHN |
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| Abstract: | ZnO thin films were prepared by electrodepositing method on transparent conducting glass substrates.The influence of deposition current on the structure and optical properties of the films was studied.XRD analysis demonstrated that the nanocrystalline ZnO thin films had wurtzite structure,the grain size of the samples decreased with the increase of the deposition current,and the preferential orientation of the film changed with the increase of the deposition current value.Optical characterizations showed that the maximum value of optical transmittance of the films was up to 84%, and the optical bandgap energy value was about 3.3 eV,irrespective of the cathodic current value. |
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| Keywords: | electrodeposition znic oxide XRD optical properties |
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