| 一种新的微透镜阵列制作技术 |
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| 引用本文： | 向鹏飞,李贝,袁安波.一种新的微透镜阵列制作技术[J].半导体光电,2012,33(2):197-200. |
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| 作者姓名： | 向鹏飞 李贝 袁安波 |
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| 作者单位： | 重庆光电技术研究所,重庆,400060;重庆光电技术研究所,重庆,400060;重庆光电技术研究所,重庆,400060 |
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| 摘 要： | 介绍了一种利用光刻、等离子体刻蚀和高温热熔等工艺在PMMA材料上制作折射微透镜的新方法,该方法具有刻蚀工艺容差大、热熔后球冠形貌好、易于和CCD实现工艺集成等优点。经过对各个工艺参数的优化实验,制备出了具有良好球冠形貌的微透镜阵列,并成功与256×256内线转移CCD完成了工艺集成,集成后微透镜阵列的整体形貌和尺寸与设计值相吻合。
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| 关 键 词： | 微透镜 光刻 刻蚀 热熔 |
New Fabrication Technology of Micro-lens Array |
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| XIANG Pengfei,LI Bei,YUAN Anbo.New Fabrication Technology of Micro-lens Array[J].Semiconductor Optoelectronics,2012,33(2):197-200. |
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| Authors: | XIANG Pengfei LI Bei YUAN Anbo |
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| Affiliation: | (Chongqing Optoelectronics Research Institute,Chongqing 400060,CHN) |
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| Abstract: | A new fabrication method of micro-lens on PMMA by combining photolithography,plasma etching and hot melt process is introduced.This method owns wide tolerance in etching process and fine spherical crown figure after hot melting process,and can be integrated with CCD easily.The micro-lens array with fine spherical crown figure was fabricated by optimized process.Process integration was achieved on 256×256 CCD with micro-lens array.The figure and dimension of micro-lens array after integration accord well with designed parameters. |
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| Keywords: | micro-lens photolithography etching hot melt |
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