Application of negative electron affinity materials to imaging devices |
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Authors: | F R Hughes E D Savoye D L Thoman |
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Affiliation: | (1) Electronic Components, RCA Corporation, 17604 Lancaster, Pennsylvania |
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Abstract: | Recent advances in materials technology, activation technology, and device technology have brought to fruition practical imaging
devices utilizing NEA photoemitters. This paper describes the characteristics of proximity-focused image tubes utilizing large-area
semitransparent, single-crystal III-V photocathode structures. Since the spectral response of the photocathode is determined
by choice of the material used as the photoemitting layer, specific choices allow optimization for specific applications;
e.g., laser illuminators. The material selection criteria and methods of fabricating the photocathode material structure will
be discussed.
The use of NEA materials allows the separation of the bulk photocathode material from other tube processing variables and
has allowed a high degree of reproducibility from device to device. Specific device characteristics to be included in this
discussion are resolution, stability of the photocathode during operation, and photocathode spectral data. |
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Keywords: | NEA Technology Semitransparent III-V Photocathodes Gallium Arsenide Vapor-Phase Epitaxy Third Generation Biplanar Image Tube |
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