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步进扫描投影光刻机工件台和掩模台的进展
引用本文:刘丹,程兆谷,高海军,黄惠杰,赵全忠,谌巍.步进扫描投影光刻机工件台和掩模台的进展[J].激光与光电子学进展,2003,40(5):14-20.
作者姓名:刘丹  程兆谷  高海军  黄惠杰  赵全忠  谌巍
作者单位:中国科学院上海光学精密机械研究所,上海,201800
摘    要:着重介绍了当前国外步进扫描投影光刻机的工件台和掩模台的发展状况,并对套刻精度和整机精度进行了分析。

关 键 词:步进扫描投影光刻机  工件台  掩模台  发展状况  套刻精度  整机精度  测量系统  控制系统
收稿时间:2003/1/17

Proress of Wafer Stage and Reticle Stage for Step-and-Scan-Lithography System
LIU Dan CHENG Zhaoyu GAO Haijun HUANG Huijie ZHAO QUANzhong SHEN Wei.Proress of Wafer Stage and Reticle Stage for Step-and-Scan-Lithography System[J].Laser & Optoelectronics Progress,2003,40(5):14-20.
Authors:LIU Dan CHENG Zhaoyu GAO Haijun HUANG Huijie ZHAO QUANzhong SHEN Wei
Abstract:Recent progress in technology of wafer stage and reticle stage used in step-and-scan lithography system is introduced, and the overlay accuracy and the accuracy of the overall system are analyzed.
Keywords:step-and-scan lithography system  wafer stage  reticle stage  overlay accuracy
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