| (Ba_(0.67)Sr_(0.33))TiO_3陶瓷靶的制备和微观结构分析 |
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| 引用本文： | 刘世建,徐重阳,曾祥斌.(Ba_(0.67)Sr_(0.33))TiO_3陶瓷靶的制备和微观结构分析[J].电子元件与材料,2001(4). |
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| 作者姓名： | 刘世建 徐重阳 曾祥斌 |
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| 作者单位： | 华中科技大学电子科学与技术系!湖北 武汉 430074，华中科技大学电子科学与技术系!湖北 武汉 430074，华中科技大学电子科学与技术系!湖北 武汉 430074 |
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| 基金项目： | 国防科技电子预研基金资助项目(99J2.2.4JW.0512) |
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| 摘 要： | 探讨了射频磁控溅射用(Ba_(0.67)Sr_(0.33))TiO_3陶瓷靶的烧结工艺，并用电子探针和X射线粉晶衍射法对其成分和微观结构进行了分析。结果表明，900～1 000℃烧结出的(Ba_(0.67)Sr_(0.33))TiO_3陶瓷靶在组织结构及成分均匀性、致密度和强度方面都符合射频磁控溅射的实际要求。
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| 关 键 词： | 钛酸锶钡陶瓷靶 烧结工艺 射频磁控溅射 微观结构 |
Preparation of (Ba_(0.67)Sr_(0.33))TiO_3 target and its microstructure. |
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| LIU Shi-jian,XU Chong-yang,ZENG Xiang-bin.Preparation of (Ba_(0.67)Sr_(0.33))TiO_3 target and its microstructure.[J].Electronic Components & Materials,2001(4). |
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| Authors: | LIU Shi-jian XU Chong-yang ZENG Xiang-bin |
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| Abstract: | The sintering technology of the (Ba_(0.67)Sr_(0.33))TiO_3 target for radio frequency magnetron sputtering is discussed. Its chemical composition is analyzed by electron probe, and its microstructure analyzed by XRD. The result show that the requirements respecting microstructure, distribution, density, etc. can be satisfied when the target sintered at the temperature range of 900℃～1 000℃. |
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| Keywords: | Ba_(0 67)Sr_(0 33))TiO_3 target sintering technology RF magnetron sputtering microstructure |
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