溅射功率对PET衬底上ZnO:Zr薄膜性能的影响

采用直流磁控溅射法在室温下柔性PET衬底上制备出了高质量的掺锆氧化锌(ZnO:Zr)透明导电薄膜。研究了溅射功率对ZnO:Zr薄膜表面形貌、结构、电学和光学性能的影响。溅射功率对ZnO:Zr薄膜的电阻率影响显著:当溅射功率从60W增加到90W时,薄膜的电阻率先减小后增大,在最佳功率80W时,电阻率具有最小值3.67×10-3Ω·cm。所制备的ZnO:Zr薄膜具有良好的附着性能,在可见光区平均透射率高达90%。

Effect of sputtering power on properties of ZnO∶Zr films deposited on PET substrate

Transparent conducting zirconium-doped zinc oxide films with high transparency and relatively low resistivity were successfully prepared on flexible PET substrate by DC magnetron sputtering at room temperature.Structure,morphology,optical and electrical properties of ZnO:Z r films were investigated.Sputtering power has significant effect on the resistivity of ZnO:Z r films.When sputtering power increases from 60 W to 100 W,the resistivity of the deposited films initially decreases and then increases.At the optimum sputtering power of 80 W,the lowest resistivity of 3.67×10-3 Ω·cm is obtained.All the films present good adhesion and a high transmittance of over 90% in the visible range.