| 双光源DMD数字光刻系统 |
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| 引用本文： | 余秋香,易云.双光源DMD数字光刻系统[J].光机电信息,2011(8):27-31. |
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| 作者姓名： | 余秋香 易云 |
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| 作者单位： | 江西应用技术职业学院;赣南师范学院; |
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| 摘 要： | 基于DMD数字光刻系统,建立了一种新型的双光源DMD数字光刻系统.双光源DMD数字光刻系统由光源照明系统、DMD数字微镜、投影物镜以及CCD调焦系统等几个部分组成.实验表明,与DMD数字光刻系统相比,双光源DMD数字光刻系统具有调焦点不被曝光的优点,可用于制作光纤端面微光学器件.
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| 关 键 词： | 双光源 DMD 数字光刻 |
Double-light-source DMD Digital Lithography System |
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| YU Qiu-xiang,YI Yun.Double-light-source DMD Digital Lithography System[J].OME Information,2011(8):27-31. |
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| Authors: | YU Qiu-xiang YI Yun |
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| Affiliation: | YU Qiu-xiang,YI Yun(1.Jiangxi Vocational College of Applied Technology,Ganzhou 341000,China,2.Gannan Normal University,China) |
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| Abstract: | A new double-light-source DMD digital lithography system was established on the basis of digital lithography technique.The system was composed of illumination system,DMD,projection lens and CCD focus system.The experiment showed that the focus point would not be exposed in the double-light-source DMD digital lithography system,so the system could be used to make the micro-optical elements in the end face of fibers. |
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| Keywords: | double-light sources DMD digital lithography |
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