|
|||||
|
|
Development of coherent scatterometry microscope |
|
| Authors: | Hiroo Kinoshita Tetsuo Harada Masato Nakasuji Yutaka Nagata Takeo Watanabe |
| Affiliation: | a University of Hyogo, Laboratory of Advanced Science and Technology for Industry, 1-1-2 Kouto Kamigouri Ako-gun, Hyogo Pref 678-1205, Japan b Riken 2-1 Hirosawa, Wako, Saitama Pref. 351-0198, Japan c JST CREST 5-3 Bancho, Chiyoda, Tokyo 102-0075, Japan |
| Abstract: | A new mask inspection system for EUVL is being developed. The resolution of previously developed actinic inspection systems, which employ FZP or Schwarzschild optics, is limited to 60 nm. This prompted us to develop a new unorthodox mask inspection system: a lensless microscope with a coherent light source. This system can detect defects only a few nanometers wide, and it enables CD measurements with a 3σ accuracy of 0.32 nm. |
| Keywords: | EUVL Defect inspection CD measurement Mask High harmonic laser source |
| 本文献已被 ScienceDirect 等数据库收录！ | |