| 离焦激光直写光刻工艺研究 |
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| 引用本文： | 李凤友,卢振武,谢永军,张殿文,裴苏,赵晶丽.离焦激光直写光刻工艺研究[J].中国激光,2002,29(9):850-854. |
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| 作者姓名： | 李凤友 卢振武 谢永军 张殿文 裴苏 赵晶丽 |
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| 作者单位： | 中国科学院长春光学精密机械和物理研究所应用光学国家重点实验室,吉林长春,130021 |
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| 基金项目： | 应用光学国家重点实验室基金，国家自然科学基金(60078006) |
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| 摘 要： | 采用理论计算和光线追迹分析了激光直写光刻中离焦对写入焦斑光场分布的影响;使用四轴激光直写设备开展了离焦激光直写光刻工艺实验,实验和理论计算及光线追迹的结果吻合得很好。利用离焦激光直写光刻方法制作了光栅和分划版,测得实验结果达到工艺要求。
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| 关 键 词： | 激光直写光刻 离焦写入 四轴激光直写系统 |
| 收稿时间： | 2001/6/22 |
Photolithographic Fabrication Techniques by Using Defocusing Laser Direct Writing |
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| LI Feng-you,LU Zhen-wu,XIE Yong-jun,ZHANG Dian-wen,PEI Su,ZHAO Jing-li.Photolithographic Fabrication Techniques by Using Defocusing Laser Direct Writing[J].Chinese Journal of Lasers,2002,29(9):850-854. |
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| Authors: | LI Feng-you LU Zhen-wu XIE Yong-jun ZHANG Dian-wen PEI Su ZHAO Jing-li |
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| Abstract: | The effect that the intensity of the writing spot relating to the amounts of defocus in the laser direct writing photolithography is analyzed based on the diffractive theory 'and the ray-tracing method, respectively. The photolithographic experiments with various amounts of defocus are developed by using four-axis laser direct writing system, which agree closely with the results of the theory or the ray-tracing method. The grating and reticle fabricated by this way are measured with atomic force microscope (AFM). |
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| Keywords: | laser direct writing photolithography defocusing writing four-axis laser direct writing system |
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