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低温缓冲层对MBE生长ZnTe材料性能的改善
引用本文:张家奇,赵杰,刘超,崔利杰,曾一平.低温缓冲层对MBE生长ZnTe材料性能的改善[J].半导体技术,2012,37(1):37-41.
作者姓名:张家奇  赵杰  刘超  崔利杰  曾一平
作者单位:中国科学院半导体研究所材料科学中心,北京,100083;中国科学院半导体研究所材料科学中心,北京,100083;中国科学院半导体研究所材料科学中心,北京,100083;中国科学院半导体研究所材料科学中心,北京,100083;中国科学院半导体研究所材料科学中心,北京,100083
基金项目:国家自然科学基金资助项目
摘    要:研究了低温缓冲层对在GaAs(001)衬底上用分子束外延(MBE)生长ZnTe薄膜晶体质量的影响。发现插入低温缓冲层后ZnTe的结晶质量、表面形貌和发光质量都得到了显著的提高,双晶X射线摇摆曲线(DCXRC)的ZnTe(004)衍射峰半峰宽(FWHM)从529 arcsec减小到421 arcsec,表面均方根(RMS)粗糙度从6.05 nm下降到3.93 nm。而作为对比,插入高温缓冲层并不能对ZnTe薄膜的质量起到改善作用。基本上实现了优化工艺的目标并为研制ZnTe基光电器件微结构材料奠定了很好的实验基础。

关 键 词:碲化锌  异质外延  低温缓冲层  高温缓冲层  分子束外延

Performance Improvement of ZnTe Material by MBE with Low-Temperature Buffer Layers
Zhang Jiaqi , Zhao Jie , Liu Chao , Cui Lijie , Zeng Yiping.Performance Improvement of ZnTe Material by MBE with Low-Temperature Buffer Layers[J].Semiconductor Technology,2012,37(1):37-41.
Authors:Zhang Jiaqi  Zhao Jie  Liu Chao  Cui Lijie  Zeng Yiping
Affiliation:(Material Science Center,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China)
Abstract:The effects of ZnTe thin films grown on GaAs(001)substrates with low-temperature buffer layers by molecular beam epitaxy(MBE)were analyzed.It has a lot of improvement to crystalline quality,surface morphology and luminous quality of the ZnTe thin films after using low-temperature buffer layers.The full-width at half-maximum(FWHM) of double-crystal X-ray rocking curve(DCXRD)for ZnTe(004)reflection decreases from 529 arcsec(without buffer layers)to 421 arcsec(with low temperature buffer layers),and the root-mean-square(RMS)roughness diminishes from 6.05 nm to 3.93 nm.However,high crystal quality ZnTe heteroepitaxy cannot be achieved by inserting a thin buffer layer at high temperature.Optimization of ZnTe growth on GaAs(001)by MBE was basically achieved,and a good experimental foundation is laid for microstructure materials of ZnTe based optoelectronic devices.
Keywords:ZnTe  heteroepitaxy  low-temperature buffer layer  high-temperature buffer layer  molecular beam epitaxy(MBE)
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