GaAs---GaAlAs heterojunction transistor for high frequency operation

A bipolar transistor structure is proposed having application for either high frequency operation or integration with certain types of light emitting devices. The structure involves liquid phase epitaxially grown layers of GaAs for the collector and base regions, and of Ga_1−xAl_xAs for the heterojunction emitter. The high frequency potential of this device results primarily from the high electron mobility in GaAs and the ability to heavily dope the base region with slowly diffusing acceptors. The Ga_1−xAl_xAs emitter region provides a favorable injection efficiency and, because it is etched preferentially relative to GaAs, access to the base layer for making contact. Transistor action with d.c. common emitter current gains of 25 have been thus for observed. Calculations of the high speed capability of this transistor are presented.