| 离子注入中污染的产生及防护 |
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| 引用本文： | 陈林.离子注入中污染的产生及防护[J].微细加工技术,1996(3):20-24. |
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| 作者姓名： | 陈林 |
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| 作者单位： | 电子工业部第４８研究所 |
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| 摘 要： | 本文概述了离子注入过程中污染产生的原因和防止污染的措施，特别强调了对微粒污染和金属污染的防护以满足ＵＬＳＩ加工对离子注入的要求。
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| 关 键 词： | 离子注入机 金属污染 微粒污染 |
GENERATION OF AND PROTECTION FROM CONTAMINATION IN ION IMPLANTATION |
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| Chen Lin..GENERATION OF AND PROTECTION FROM CONTAMINATION IN ION IMPLANTATION[J].Microfabrication Technology,1996(3):20-24. |
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| Authors: | Chen Lin |
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| Abstract: | The reasons of generating contamination and the measures of protection from contamination in ion implantation are summarized. The protection from metal and particle contamination is emphasized to meet the requirement of ULSI manufacture. |
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| Keywords: | ion implanter metal contamination particle contamination |
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