| 应用于扩散工艺中的闭管扩散技术 |
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| 引用本文： | 向小龙,彭志虹,朱晓明,罗卫国,赵加宝,罗亮.应用于扩散工艺中的闭管扩散技术[J].微细加工技术,2006(6):63-64. |
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| 作者姓名： | 向小龙 彭志虹 朱晓明 罗卫国 赵加宝 罗亮 |
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| 作者单位： | 中国电子科技集团公司第四十八研究所,长沙,410111 |
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| 摘 要： | 介绍了一种用于晶体硅太阳能电池p-n结制造的闭管扩散技术,它主要是针对目前使用的开管扩散技术的不足而提出的,实践证明,该技术不仅扩散均匀性优,而且节源、节能、环保,同时它还可以运用于其它半导体材料的扩散掺杂工艺。
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| 关 键 词： | 闭管扩散技术 扩散均匀性 |
| 文章编号： | 1003-8213(2006)06-0063-02 |
Technology of Diffusion in Closed Tube |
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| XIANG Xiao-long,PENG Zhi-hong,WU Bo,ZHU Xiao-ming.Technology of Diffusion in Closed Tube[J].Microfabrication Technology,2006(6):63-64. |
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| Authors: | XIANG Xiao-long PENG Zhi-hong WU Bo ZHU Xiao-ming |
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| Abstract: | A new diffusion technology was introduced,which the diffusion was taken place in a closed tube and used for preparation of the p-n contacts of the crystalline silicon solar cells.The technology was developed to improve the diffusion in the opening tube.The practical results have proved that the technique not only produces a uniform diffusion but also saves power and prevents from pollution,and it can be used for doping of other semiconductor materials. |
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| Keywords: | technology of diffusion in closed tube uniformity of diffusion |
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