| 微柱透镜阵列的全息-光刻胶热熔制作技术 |
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| 引用本文： | 任智斌,姜会林,付跃刚,张磊,田继文,齐向东,李文昊.微柱透镜阵列的全息-光刻胶热熔制作技术[J].微细加工技术,2006(4):17-20. |
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| 作者姓名： | 任智斌 姜会林 付跃刚 张磊 田继文 齐向东 李文昊 |
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| 作者单位： | 1. 长春理工大学,光电工程学院,长春,130022
2. 中国科学院长春光学精密机械与物理研究所,长春,130033 |
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| 摘 要： | 为改善微柱透镜阵列的制作技术、消除光刻工艺对光刻掩模版的依赖,研究了利用全息-热熔技术制作微柱透镜阵列的新方法,即首先采用了全息技术进行曝光,然后利用光刻胶热熔技术在K9玻璃基底上制作出了面形良好的微柱透镜阵列。实验结果表明,进行全息曝光并显影后,能够在光刻胶表面产生良好的正弦阵列表面结构,之后采用光刻胶热熔技术可将光刻胶的正弦阵列结构转变为微柱透镜阵列,且实验结果良好。
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| 关 键 词： | 微柱透镜阵列 全息曝光 光刻胶热熔 |
| 文章编号： | 1003-8213(2006)04-0017-04 |
| 修稿时间： | 2005年11月20 |
Holographic-melting Photoresist Technology of Fabrication of Micro-cylindrical Lens Arrays |
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| REN Zhi-bin,JIANG Hui-lin,FU Yue-gang,ZHANG Lei,TIAN Ji-wen,QI Xiang-dong,LI Wen-hao.Holographic-melting Photoresist Technology of Fabrication of Micro-cylindrical Lens Arrays[J].Microfabrication Technology,2006(4):17-20. |
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| Authors: | REN Zhi-bin JIANG Hui-lin FU Yue-gang ZHANG Lei TIAN Ji-wen QI Xiang-dong LI Wen-hao |
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| Abstract: | A new fabricating method of micro-cylindrical lens arrays by adopting holographic exposure-melting photoresist technology is studied to improve the fabrication technology of micro-cylindrical lens arrays and eliminate dependence of photo-masks during photolithography.The photoresist is exposed by holographic technology and then melted to make a fine micro-cylindrical lens array on the K9 glass substrate.The results show that a fine sinusoidal array structure is formed on the photoresist surface by holographic exposure and it is changed into a micro-cylindrical lens array by melting of the photoresist.The result provides a new technology of fabrication of micro-cylindrical lens arrays and it is significant to further improve of the fabrication technology of micro-cylindrical lens arrays. |
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| Keywords: | micro-cylindrical lens array holographic exposure melting photoresist |
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