| 折射微透镜制备中离子束刻蚀过程的计算机模拟 |
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| 引用本文： | 陈长虹,易新建,赵兴荣.折射微透镜制备中离子束刻蚀过程的计算机模拟[J].微细加工技术,2000(2):34-38. |
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| 作者姓名： | 陈长虹 易新建 赵兴荣 |
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| 作者单位： | 华中理工大学光电子工程系,武汉,430074 |
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| 摘 要： | 建立氩离子束对光刻胶微透镜的刻蚀模型，模拟折射微透镜制备中的离子束刻蚀工艺过程。通过模拟可以预先获得离子束在不同倾斜入射状态下所得到的折射微透镜的截面轮廓，为优化离子束的刻蚀工艺奠定基础，同时也可以确定刻蚀过程的终点时刻。
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| 关 键 词： | 微光学 微透镜 离子束刻蚀 模拟 |
| 文章编号： | 1003-8213(2000)02-0007-06 |
| 修稿时间： | 1999-08-02 |
Computer Simulation of Ion Beam Etching Process in Fabricating Refractiue Microlens |
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| CHEN Chang-hong,YI Xin-jian,ZHAO Xing-rong.Computer Simulation of Ion Beam Etching Process in Fabricating Refractiue Microlens[J].Microfabrication Technology,2000(2):34-38. |
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| Authors: | CHEN Chang-hong YI Xin-jian ZHAO Xing-rong |
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| Affiliation: | CHEN Chang-hong
,YI Xin-jian
,ZHAO Xing-rong
;(Department of Optoelectronic Engineering, Huazhong University of Science & Technology, Wuhan 430074, China) |
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| Abstract: | The ion beam etching process in fabricating refractiue microlens is simulated by setting up the etching model of Argonion beam to resist microlens. Through simulation the profiles of refractiue microlens obtained in the different ion beam incident angles can be predicted, which is the basis for optimizing the ion beam etching process and determine the end time of etching process. |
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| Keywords: | Micro-optics Microlens Ion-beametching Simulation |
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