Effect of growth temperature on properties of transparent conducting gallium-doped ZnO films |
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Authors: | A Kh Abduev A K Akhmedov A Sh Asvarov A A Abdullaev S N Sulyanov |
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Affiliation: | (1) Ichikawa Research Laboratory, Sumitomo Metal Mining Co., Ltd., Nakakokubun, Ichikawa-shi, Chiba 272-8588, Japan |
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Abstract: | Transparent conducting gallium-doped ZnO films are deposited on glass substrates by magnetron sputtering of conducting ceramic
targets. The dependences of structural, electric, and optical characteristics of ZnO:Ga films on the substrate temperature
are investigated during the deposition. Stability of resistivity of films is considered during annealing in air. It is found
that the films deposited at the substrate temperature of 250°C have the lowest resistivity of 3.8 × 10−4 Ω cm, while those deposited at 200°C have the highest thermal stability. |
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