| 新世纪光刻技术及光刻设备的发展趋势 |
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| 引用本文： | 苏雪莲.新世纪光刻技术及光刻设备的发展趋势[J].微电子技术,2001,29(2):8-17. |
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| 作者姓名： | 苏雪莲 |
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| 作者单位： | 中国华晶电子集团公司技术支援中心, |
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| 摘 要： | 本文主要阐述了光刻技术的发展极限及193nm,157nm光学光刻技术和电子束投影光刻（SCALPEL）、X－射线光刻（XRL）离子投影光刻（IPL）等技术的发展趋势。并详细介绍了国际著名品牌的光刻机以及即将推出的新一代光刻机。对国内光刻设备的发展现状作了简要概述。
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| 关 键 词： | 光刻技术 光刻设备 电子束投影光刻 光学光刻 |
| 文章编号： | 1008-0147(2001)02-08-10 |
Trend of Photolithography Technology and Its
Equipment in 21st Century |
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| SU Xue-lian.Trend of Photolithography Technology and Its
Equipment in 21st Century[J].Microelectronic Technology,2001,29(2):8-17. |
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| Authors: | SU Xue-lian |
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| Abstract: | The limitation of photolithography technology and the trend of 193nm,157nm photolithography technology,SCALPEL,x ray photolithography,and IPL are analyzed in the article.The international brand named photolithography equipmemt and the ready to ship new generation of photolithography equipment are also introduced,and the current status of domestic photolithography equipmemt is briefly mentioned. |
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| Keywords: | Photolithography Microelectronic technology Specific equipment Limitation |
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