| 红外迷彩伪装对发射率要求的数值分析 |
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| 引用本文： | 刘姜伟,时家明,陈宗胜,许波.红外迷彩伪装对发射率要求的数值分析[J].红外与激光工程,2012,41(2):442-445. |
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| 作者姓名： | 刘姜伟 时家明 陈宗胜 许波 |
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| 作者单位： | 脉冲功率激光技术国家重点实验室,安徽合肥230037;红外与低温等离子体安徽省重点实验室,安徽合肥230037 |
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| 基金项目： | 红外与低温等离子体安徽省重点实验室主任基金(201A001002D) |
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| 摘 要： | 针对红外迷彩伪装涂层中发射率的取值问题建立了计算模型。推导计算了目标8~14μm的平均发射率εt对目标辐射温度TR的影响,并以4 K辐射温差作为隐身标准,计算分析了目标不同真实温度T对εt取值范围的影响以及相邻斑块发射率差值△εt与固定斑块发射率ε1、目标真实温度T的关系。所得结论对红外迷彩伪装涂层的制备具有一定的指导作用。
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| 关 键 词： | 红外迷彩伪装 辐射温度 发射率 辐射温差 |
Numerical analysis of requirement of emissivity for infrared pattern painting camouflage |
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| Liu Jiangwei
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Shi Jiaming
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Chen Zongsheng
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Xu Bo.Numerical analysis of requirement of emissivity for infrared pattern painting camouflage[J].Infrared and Laser Engineering,2012,41(2):442-445. |
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| Authors: | Liu Jiangwei Shi Jiaming Chen Zongsheng Xu Bo |
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| Affiliation: | 1,2(1.State Key Laboratory of Pulsed Power Laser Technology,Hefei 230037,China; 2.Key Lab of IR and Low Temperature Plasma of Anhui,Hefei 230037,China) |
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| Abstract: | Calculation model was put forward to solve the numeric problem that how to identify the range of the pattern painting camouflage′s emissivity.Effect of the change of 8-14 μm waveband average emissivity εt on the target′s radiation temperature TR was inferred and calculated.Based on the stealth criterion of 4 K radiation temperature difference,the range of the emissivity εt for different target′s temperature T was calculated and analyzed.The relationship of the emissivity difference Δεt of the spots adjacent to each other and the fixed spot′s emissivity ε1,the target′s temperature T was also discussed.The result shows that the conclusion plays guiding role in preparation of pattern painting camouflage. |
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| Keywords: | infrared pattern painting camouflage radiation temperature emissivity radiation temperature difference |
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