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脉冲激光纳米薄膜制备技术
引用本文:李美成,陈学康,杨建平,王菁,赵连城.脉冲激光纳米薄膜制备技术[J].红外与激光工程,2000,29(6):31-35.
作者姓名:李美成  陈学康  杨建平  王菁  赵连城
作者单位:1. 哈尔滨工业大学材料科学与工程学院,哈尔滨,150001
2. 兰州物理研究所激光分子束外延技术实验室,兰州,730000
基金项目:国防科技预研跨行业综合技术项目,18.9.2,
摘    要:脉冲激光薄膜沉积(PLD)是近年来受到普遍关注的制膜新技术。简要介绍了该技术的物理原理;探讨了脉冲激光沉积制膜的物理过程,激光作用的极端条件及等离子体羽辉形成的控制对薄膜成长的影响;评价了脉冲激光沉积技术在多种功能材料薄膜,特别是纳米薄膜及多层结构薄膜的制备方面的特点和优势,结合自行研制的设备,介绍了在PLD基础上发展起来的兼具分子束外延(MBE)技术特点的激光分子束外延技术(L-MBE),指出脉冲激光沉积技术在探讨激光与物理相互作用和薄膜成膜机理方面的作用,尤其是激光分子束外延技术在高质量的纳米薄膜和超晶格等人工设计薄膜的制备上显现出的巨大潜力。

关 键 词:脉冲激光沉积  制膜技术  纳米薄膜
修稿时间::

Pulsed laser deposition of nanometer thin films
Li Meicheng,Chen Xuekang,Yang Jianping,Wang Jing,Zhao Liancheng.Pulsed laser deposition of nanometer thin films[J].Infrared and Laser Engineering,2000,29(6):31-35.
Authors:Li Meicheng  Chen Xuekang  Yang Jianping  Wang Jing  Zhao Liancheng
Abstract:The pulsed laser deposition (PLD) is a new promising technique for the growth of thin films attended generally by people recently. In this paper, the physical principle of PLD is introduced briefly, the physical process is discussed, it is seen that the uttermost condition of laser and the formation of plasma affect the form of films. Unique characteristics and the advantages of this technique to form functional thin films and nanometer thin films are appraised. In addition, based on the equipment manufactured by ourselves, the laser molecular beam epitaxy (L\|MBE) which combining the characteristics of PLD with ones of molecular beam epitaxy (MBE) is introduced. It is shown that the PLD technique is a potent tool for research of the interaction between laser and substance as well as the formation principle of thin films. Especially, laser molecular beam epitaxy (L\|MBE) plays an important role in the preparing of high quality nanometer thin films and in layer by layer growth of superlattice.
Keywords:Pulsed laser deposition  Nanometer thin film  Laser molecular beam epitaxy  Infrared detector
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