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脉冲激光沉积制备TiN/AlN多层薄膜及其工艺研究
引用本文:唐普洪,宋仁国,柴国钟,熊京远.脉冲激光沉积制备TiN/AlN多层薄膜及其工艺研究[J].四川激光,2010(2):41-43.
作者姓名:唐普洪  宋仁国  柴国钟  熊京远
作者单位:浙江工业大学机械制造及自动化教育部重点实验室;嘉兴职业技术学院;
基金项目:浙江省自然科学基金青年科技人才培养项目(R405031)资助课题
摘    要:本文采用脉冲激光沉积(PLD)法,在单晶硅试样表面上沉积制备了TiN/AlN多层硬质薄膜;研究了激光能量、靶衬距离和基体温度等工艺参数对薄膜性能的影响。采用X射线衍射(XRD)、扫描电子显微镜(SEM)和显微硬度仪方法研究了薄膜的性能。结果表明:薄膜由TiN和立方AlN细晶和无定型的非晶TiN、AlN组成,薄膜的调制周期尺寸均在λ=(50-200)nm范围内,多层结构界面清晰;当多层薄膜调制周期在100nm以下时,薄膜的显微硬度明显高于TiN和AlN的混合硬度值。

关 键 词:脉冲激光烧蚀  多层膜  微观结构  TiN/AlN

Experimental study of TiN/AlN multilayer thin films prepared by pulsed laser deposition
TANG Pu-hong,SONG Ren-guo,CHAI Guo-zhong,XIONG Jing-yuan.Experimental study of TiN/AlN multilayer thin films prepared by pulsed laser deposition[J].Laser Journal,2010(2):41-43.
Authors:TANG Pu-hong    SONG Ren-guo  CHAI Guo-zhong  XIONG Jing-yuan
Affiliation:1.The MOE Key Laboratory of Mechanical Manufacture and Automation;Zhejiang University of Technology;Hangzhou 310014;China;2.College of Jiaxing Vocational Technology;Jiaxing 314036;China
Abstract:The TiN/AlN thin films are deposited on silicon substrate by means of pulsed laser deposition.The influences of technology parameters,like laser fluence,distance between target and substrate,deposition time and temperature on microhandness of TiN/AlN films are studied.Both composition and structure of the films are analyzed by microhardness tester,XRD and SEM.It is suggested that films are of multilayer structure composed of cubic-TiN/a-AlN.The interface between the TiN and AlN layers is very sharp because ...
Keywords:pulsed laser(PLA)  multilayer films  microstructure  TiN/AlN  CLC number  TG174  445  TG156  95
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