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1.46 μm room-temperature emission from InAs/InGaAs quantum dot nanostructures
作者姓名:L  Seravalli  P  Frigeri  V  Avanzini  S  Franchi
作者单位:CNR-IMEM Institute, Parco deUe Scienze 37/a, 1-43100 Parma, Italy
基金项目:The work has been partially supported by the "SANDiE" Network of Excellence of EU(contract no. NMP4-CT-2004-500101). The AFM characterization has been carried out at CIM, University of Parma.
摘    要:We present a study on InAs/InGaAs QDs nanostructures grown by molecular beam epitaxy on InGaAs metamorphic buffers, that are designed so as to determine the strain of QD and, then, to shift the luminescence emission towards the 1.5 μm region (QD strain engineering). Moreover, we embed the QDs in InAIAs or GaAs barriers in addition to the InGaAs confining layers, in order to increase the activation energy for confined carrier thermal escape; thus, we reduce the thermal quenching of the photoluminescence, which prevents room temperature emission in the long wavelength range. We study the dependence of QD properties, such as emission energy and activation energy, on barrier thickness and height and we discuss how it is possible to compensate for the barrier-induced QD emission blue-shift taking advantage of QD strain engineering. Furthermore, the combination of enhanced barriers and QD strain engineering in such metamorphic QD nanostmctures allowed us to obtain room temperature emission up to 1.46μm, thus proving how this is a valuable approach in the auest for 1.55 um room temperature emission from ODs grown on GaAs substrates.

关 键 词:InAs  InGaAs  自组装量子点  纳米结构  室温发光
文章编号:1673-1905(2007)03-0165-04
收稿时间:29 November 2006
修稿时间:2006-11-29

1.46 μm room-temperature emission from InAs/InGaAs quantum dot nanostructures
L Seravalli P Frigeri V Avanzini S Franchi.1.46 μm room-temperature emission from InAs/InGaAs quantum dot nanostructures[J].Opto-electronics Letters,2007,3(3):165-168.
Authors:L Seravalli  P Frigeri  V Avanzini and S Franchi
Affiliation:(1) CNR-IMEM Institute, Parco delle Scienze 37/a, I-43100 Parma, Italy
Abstract:We present a study on InAs/InGaAs QDs nanostructures grown by molecular beam epitaxy on InGaAs metamorphic buffers, that are designed so as to determine the strain of QD and, then, to shift the luminescence emission towards the 1.5 μm region (QD strain engineering). Moreover, we embed the QDs in InAlAs or GaAs barriers in addition to the InGaAs confining layers, in order to increase the activation energy for confined carrier thermal escape; thus, we reduce the thermal quenching of the photoluminescence, which prevents room temperature emission in the long wavelength range. We study the dependence of QD properties, such as emission energy and activation energy, on barrier thickness and height and we discuss how it is possible to compensate for the barrier-induced QD emission blue-shift taking advantage of QD strain engineering. Furthermore, the combination of enhanced barriers and QD strain engineering in such metamorphic QD nanostructures allowed us to obtain room temperature emission up to 1.46 μm, thus proving how this is a valuable approach in the quest for 1.55 gmm room temperature emission from QDs grown on GaAs substrates. The work has been partially supported by the “SANDiE” Network of Excellence of EU(contract no. NMP4-CT-2004-500101). The AFM characterization has been carried out at CIM, University of Parma.
Keywords:TN256  TB383
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