| 基于非晶硅薄膜的微测辐射热计光学仿真和优化 |
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| 引用本文： | 何 敏,李 伟,李雨励,孙 言,蒋亚东.基于非晶硅薄膜的微测辐射热计光学仿真和优化[J].红外技术,2012,34(6):319-325. |
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| 作者姓名： | 何 敏 李 伟 李雨励 孙 言 蒋亚东 |
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| 作者单位： | 1. 电子科技大学光电信息学院,四川成都,610054
2. 电子科技大学电子薄膜与集成器件国家重点实验室,四川成都,610054 |
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| 摘 要： | 基于非晶硅薄膜的非制冷微测辐射热计具有结构简单、易于大规模集成、工艺兼容以及良好探测性能等特点,在红外探测领域等受到关注。引入氮化钛薄膜作为新型红外吸收材料,通过光学导纳矩阵法,对基于非晶硅薄膜的微测辐射热计的红外吸收特性,进行了仿真和优化研究。结果表明,非晶硅微测辐射热计中,氮化钛/非晶硅复合薄膜具有良好的红外吸收性能。当非晶硅薄膜厚度为120 nm时,由氮化钛/非晶硅组成的膜系在8～14μm范围内具有96%左右的红外吸收率,其中氮化钛薄膜的最佳吸收厚度为32nm。
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| 关 键 词： | 非晶硅 氮化钛 微测辐射热计 光学仿真 |
| 收稿时间： | 2012/4/6 |
Optical Optimization and Simulation of Micro-bolometers Based on α-Si:H Thin Film |
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| HE Min
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LI Wei
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LI Yu-li
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SUN Yan
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JIANG Ya-dong.Optical Optimization and Simulation of Micro-bolometers Based on α-Si:H Thin Film[J].Infrared Technology,2012,34(6):319-325. |
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| Authors: | HE Min LI Wei LI Yu-li SUN Yan JIANG Ya-dong |
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| Affiliation: | 1.School of Optoelectronic Information,University of Electronic Science and Technology of China,Chengdu 610054,China; 2.State Key Laboratory of Electronic Thin Films & Integrated Devices, University of Electronic Science and Technology of China,Chengdu 610054,China) |
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| Abstract: | Uncooled micro-bolometer based on hydrogenated amorphous silicon(α-Si:H) thin film has attracted many attentions in the infrared (IR) field of civilian and military applications due to its simple cell-structure, good compatibility for large scale integration and effective detection. In this paper, we bring in titanium nitride as a novel infrared absorption material and carry out some optical simulation and optimization on the infrared absorbing performance of micro-bolometers based on α-Si:H thin film. The results show that when the a-Si:H thin film is taken as 120 nm thick, the combined thin film layer consisting of TiN and α-Si:H has a high infrared absorption as high as 96% in the wavelength from 8 μm to 14 μm, in which the best thickness of TiN thin film is 32 nm. |
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| Keywords: | α-Si:H，micro-bolometer，TiN，optical simulation |
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