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用于软刻蚀复型及转印前后形貌比较的反向重定位AFM成像方法
引用本文:唐雨钊,周虹杉,张峰,吴志华,张晓东,孙洁林,胡钧.用于软刻蚀复型及转印前后形貌比较的反向重定位AFM成像方法[J].电子显微学报,2006,25(6):472-476.
作者姓名:唐雨钊  周虹杉  张峰  吴志华  张晓东  孙洁林  胡钧
作者单位:1. 上海交通大学生命科学技术学院,上海,200240
2. 中国科学院上海应用物理研究所,上海,201800
3. 上海交通大学生命科学技术学院,上海,200240;中国科学院上海应用物理研究所,上海,201800
基金项目:国家自然科学基金;上海市纳米科技专项基金
摘    要:软刻蚀技术运用聚二甲基硅氧烷(Poly dimethylsiloxane,PDMS)等聚合物材料制备弹性图章,并用制备好的图章转印图形结构至特定基底。在很多情况下需对模板和弹性图章、图章与转印图形同一位置的形貌进行表征。基于原子力显微镜观测的反向重定位技术提供了一种微观区域内对二雏平面互为镜像关系的两种样品的原位对比观测方法。本文利用坐标实时显示的程控高精度样品台系统,联合使用非对称表面标记及坐标镜像复制的定位法,实现了对样品的精确反向重定位成像。

关 键 词:原子力显微镜  反向重定位  软刻蚀  表面标记坐标系  高精度样品台系统
文章编号:1000-6281(2006)06-0472-05
收稿时间:2006-04-20
修稿时间:2006-04-202006-06-15

Reverse reposition imaging technique of AFM used to compare the topography of the master, stamp and the pattern in soft lithography
TANG Yu-zhao,ZHOU Hong-shan,ZHANG Feng,WU Zhi-hua,ZHANG Xiao-dong,SUN Jie-lin,HU Jun.Reverse reposition imaging technique of AFM used to compare the topography of the master, stamp and the pattern in soft lithography[J].Journal of Chinese Electron Microscopy Society,2006,25(6):472-476.
Authors:TANG Yu-zhao  ZHOU Hong-shan  ZHANG Feng  WU Zhi-hua  ZHANG Xiao-dong  SUN Jie-lin  HU Jun
Affiliation:1. School of Life Science and Biotechnology, Shanghai Jiao-Tong University, Shanghai 200240 ; 2 Shanghai Institute of Applied Physics, Chinese Academy of Science, Shanghai 201800,China
Abstract:Based on the elastic stamp made of polymer material such as(Poly dimethylsiloxane)PDMS,soft lithography replicated the mold by the stamp and translated the pattern of the stamp into the special substrate.In most cases,it needs to show the topograph features of the mold as well as the corresponding reverse position of the replica in soft lithography.Reverse reposition imaging technique of AFM(atomic force microscopy) provides an observing method to compare the difference between the master and the replica at the corresponding position in microscale.In this paper,it has been developed an accurate reverse reposition AFM imaging technique by simple asymmetry mark in surface on AFM system,which equipped with a program-controlled high resolution sample stage.With the advantage of the sample stage system,it was achieved the real-time displaying surface mark coordinates of the master and the replica.The experiment results showed that the replica reversed position corresponding to the master can be relocated easily and efficiently.
Keywords:atomic force microscope  reverse reposition  soft lithography  surface mark coordinate  program-controlled high resolution samplestage system
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