Affiliation: | 1. School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656 Japan;2. International Graduate Program of Molecular Science and Technology (NTU-MST), National Taiwan University, No. 1, Sec. 4, Roosevelt Rd., Taipei, 10617 Taiwan;3. International Graduate Program of Molecular Science and Technology (NTU-MST), National Taiwan University, No. 1, Sec. 4, Roosevelt Rd., Taipei, 10617 Taiwan
Department of Materials Science and Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Rd., Taipei, 10617 Taiwan
Molecular Science and Technology Program, Taiwan International Graduate Program (TIGP) Academia Sinica, No. 128, Sec. 2, Academia Rd., Taipei, 11529 Taiwan;4. Department of Chemistry, National Taiwan Normal University, No. 88, Sec. 4, Ting-Chow Rd, Taipei, 11677 Taiwan |
Abstract: | Lead halide perovskites exhibit extraordinary optoelectronic performances and are being considered as a promising medium for high-quality photonic devices such as single-mode lasers. However, for perovskite-based single-mode lasers to become practical, fabrication and integration on a chip via the standard top-down lithography process are strongly desired. The chief bottleneck to achieving lithography of perovskites lies in their reactivity to chemicals used for lithography as illustrated by issues of instability, surface roughness, and internal defects with the fabricated structures. The realization of lithographic perovskite single-mode lasers in large areas remains a challenge. In this work, a self-healing lithographic patterning technique using perovskite CsPbBr3 nanocrystals is demonstrated to realize high-quality and high-crystallinity single-mode laser arrays. The self-healing process is compatible with the standard lithography process and greatly improves the quality of lithographic laser cavities. A single-mode microdisk laser array is demonstrated with a low threshold of 3.8 µJ cm?2. Moreover, the control of the lasing wavelength is made possible over a range of up to 6.4 nm by precise fabrication of the laser cavities. This work presents a general and promising strategy for standard top-down lithography fabrication of high-quality perovskite devices and enables research on large-area perovskite-based integrated optoelectronic circuits. |