| 下一代光刻技术的设备 |
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| 引用本文： | 翁寿松.下一代光刻技术的设备[J].电子工业专用设备,2004,33(10):35-38. |
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| 作者姓名： | 翁寿松 |
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| 作者单位： | 无锡市罗特电子有限公司,江苏,无锡,214002 |
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| 摘 要： | 下一代光刻技术是指≤32nm工艺节点的光刻技术。介绍了下一代光刻技术与设备,包括X射线光刻技术、极紫外线光刻技术和纳米压印光刻技术等。
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| 关 键 词： | 下一代光刻技术 X射线光刻技术 极紫外线光刻技术 纳米压印光刻技术 |
| 文章编号： | 1004-4507(2004)10-0035-04 |
| 修稿时间： | 2004年9月10日 |
Next Generation Lithography and Equipment |
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| WENG Shou-song.Next Generation Lithography and Equipment[J].Equipment for Electronic Products Marufacturing,2004,33(10):35-38. |
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| Authors: | WENG Shou-song |
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| Abstract: | The next generation lithography is the lithography technology of the ≤32 nm technology node. In this paper, the next generation lithography and equipment are introduced, consist of the x-ray lithography, the extreme ultraviolet lithography, the nanoimprint lithography and so on. |
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| Keywords: | Next generation lithography X-ray lithography Extreme ultraviolet lithography Nanoimprint lithography |
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