首页 | 本学科首页   官方微博 | 高级检索  
     

低品位氧化铜矿石选矿工艺研究进展
引用本文:王龙,牛福生,张晋霞,聂轶苗.低品位氧化铜矿石选矿工艺研究进展[J].金属矿山,2016,45(9):127-131.
作者姓名:王龙  牛福生  张晋霞  聂轶苗
作者单位:华北理工大学矿业工程学院,河北 唐山 063009
摘    要:我国低品位氧化铜矿石资源储量较丰富,而易选、高品位铜矿石资源较贫乏。为解决我国铜资源的自给自足问题,加强低品位氧化铜矿石资源的选冶技术研究非常必要。为使业界较全面了解低品位氧化铜矿石资源的开发利用现状,推动低品位氧化铜矿石资源选冶技术的进步,主要从常规浸出、细菌浸出、选冶联合工艺等方面介绍了低品位氧化铜矿石选矿技术的研究现状和进展,并且指出常规浸出、细菌浸出以及选冶联合工艺将是未来解决低品位难选氧化铜矿石资源开发利用问题的重要手段。

关 键 词:氧化铜矿石  酸浸  细菌浸出  选冶联合工艺  

Research Progress of Mineral Processing Technology of Low Grade Copper Oxide Ore
Wang Long,Niu Fusheng,Zhang Jinxia,Nie Yimiao.Research Progress of Mineral Processing Technology of Low Grade Copper Oxide Ore[J].Metal Mine,2016,45(9):127-131.
Authors:Wang Long  Niu Fusheng  Zhang Jinxia  Nie Yimiao
Affiliation:School of Mining Engineering,North China University of Science and Technology,Tangshan 063009,China
Abstract:The storage of low-grade copper oxide ore in our country is great,but the easy-processing and high-grade cop-per ore resources are relatively poor. In order to solve the problem of copper oxide ore resources self-sufficiency,enhance the beneficiation and metallurgy research of low grade copper oxide resources is really essential. In order to let the mineral process-ing workers fully understand the current development and utilization situation of low-grade copper oxide ore resources,promo-ting the progress of low-grade copper resources beneficiation and metallurgy technology,research situation and progress of low-grade copper oxide ore beneficiation technology was introduced mainly from conventional leaching,bacterial leaching,dressing-metallurgy combination technology. In addition,conventional leaching,bacterial leaching and dressing-metallurgy combination technology are important methods for resolving the low-grade refractory copper oxide ore resources development and utilization.
Keywords:Copper oxide ore  Acid leaching  Bacterial leaching  Beneficiation-metallurgy technology
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《金属矿山》浏览原始摘要信息
点击此处可从《金属矿山》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号