| 不同工艺制备的氟化镁材料对真空镀膜的影响 |
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| 引用本文： | 王武育,孙平.不同工艺制备的氟化镁材料对真空镀膜的影响[J].稀有金属,1998,22(1):22-25. |
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| 作者姓名： | 王武育 孙平 |
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| 作者单位： | 1. 北京有色金属研究总院,北京100088
2. 北京师范大学物理系 |
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| 摘 要： | 用三种不同工艺制得的氟化镁为镀膜材料，考察了不同材料的结构对镀膜工艺和薄膜光学性能折射率的影响，并就其影响的原因进行了宏观分析，为选择高质量的镀膜材料提供了理论依据。
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| 关 键 词： | MgF_2 真空镀膜 |
Influence of Preparation Process for MgF2 on Vacuum Plating |
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| Wang Wuyu,Sun Ping.Influence of Preparation Process for MgF2 on Vacuum Plating[J].Chinese Journal of Rare Metals,1998,22(1):22-25. |
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| Authors: | Wang Wuyu Sun Ping |
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| Abstract: | Three types of MgF 2 materials (powder, tablet and crystal granule) which prepared by different methods were applied in the process of vacuum plating. The influence of MgF 2 structure on coating process and optical properties, such as refraction index ( n ), was studied. The reason of influence was discussed so that the theoretical basis of selection of high quality coating materials was provided. |
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| Keywords: | MgF 2 Vacuum plating Refraction index |
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