| 靶材热处理温度对磁控溅射Mo薄膜组织和性能的影响 |
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| 引用本文： | 张国君,马杰,安耿,孙院军.靶材热处理温度对磁控溅射Mo薄膜组织和性能的影响[J].中国钼业,2014(6):36-40. |
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| 作者姓名： | 张国君 马杰 安耿 孙院军 |
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| 作者单位： | 西安交通大学;西安理工大学;金堆城钼业股份有限公司 |
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| 基金项目： | 国家“十二五”科技支撑计划项目:钨、钼的增值化利用产业化技术开发(2012BAE06B02) |
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| 摘 要： | 采用磁控溅射设备和经过不同温度热处理的Mo靶材,以相同的溅射工艺参数,在Si基片上制备了Mo金属薄膜,研究了靶材的热处理温度对Mo薄膜组织和性能的影响。研究结果发现,所制备Mo薄膜均呈现（110）晶面择优取向,而靶材热处理温度的升高能够提高（110）晶面的择优取向程度。所有薄膜均为T型低温抑制生长。比较结果表明：经1 200℃热处理的Mo靶材溅射率最高（18.5 nm/min）,且其溅射膜具有较小的方阻值和较好的厚度均匀性,综合性能最优。
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| 关 键 词： | 钼靶材 Mo薄膜 择优取向 电性能 |
INFLUENCE OF ANNEALING TEMPERATURE OF MO SPUTTERING TARGET ON THE MICROSTRUCTURE AND PROPERTIES OF MO FILMS |
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| ZHANG Guo-jun;MA Jie;AN Geng;SUN Yuan-jun.INFLUENCE OF ANNEALING TEMPERATURE OF MO SPUTTERING TARGET ON THE MICROSTRUCTURE AND PROPERTIES OF MO FILMS[J].China Molybdenum Industry,2014(6):36-40. |
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| Authors: | ZHANG Guo-jun;MA Jie;AN Geng;SUN Yuan-jun |
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| Affiliation: | ZHANG Guo-jun;MA Jie;AN Geng;SUN Yuan-jun;Xi’an Jiaotong University;Xi’an University of Science and Technology;Jinduicheng Molybdenum Co. ,Ltd.; |
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| Abstract: | Using magnetron sputtering system and Mo targets annealed by different temperatures,Mo metal thin films were deposited on Si substrate in the same sputtering parameters. The influence of annealing temperature of Mo target on the microstructure and properties of Mo films were studied. The results indicate that Mo films have preferred orientation of（ 110）,and the increase of targets＇ annealing temperature can improve the degree of preferred orientation of（ 110） crystal plane. All samples have T-type growth inhibited by low temperature. The sample annealed at 1 200 ℃ has the highest sputtering rate of 18. 5 nm / min,and its sputtering film has the best comprehensive properties of low square resistance and good uniformity. |
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| Keywords: | Mo target Mo films preferred orientation electrical properties |
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