| 积极开发低硅烧结技术 |
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| 引用本文： | 应自伟,姜茂发,许力贤,施月循,廉树杰,田青.积极开发低硅烧结技术[J].烧结球团,2002,27(6):8-11,23. |
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| 作者姓名： | 应自伟 姜茂发 许力贤 施月循 廉树杰 田青 |
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| 作者单位： | 东北大学材料与冶金学院 |
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| 摘 要： | 阐述了开发低硅烧结技术的意义。介绍了低硅烧结矿的特点、生产状况及在高炉上的应用效果，并提出了实现低硅烧结应采取的工艺措施及今后的研究方向。
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| 关 键 词： | 低硅烧结矿 还原性 强度 RDI PCI |
LOW SiO2 SINTERING TECHNIQUE |
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| Yin Ziwei et al.LOW SiO2 SINTERING TECHNIQUE[J].Sintering and Pelletizing,2002,27(6):8-11,23. |
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| Authors: | Yin Ziwei |
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| Affiliation: | Yin Ziwei et al |
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| Abstract: | In this paper,the signification of positive developing low SiO 2 sintering techinque is described The characteristics of low SiO 2 sinter and the current level of low SiO 2 in sintering plant are introduced,what is more,the application results in blast furnace is also introduced Corresponding process measures of realizing low SiO 2 sintering and future study trend for low SiO 2 sintering are put out |
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| Keywords: | low SiO 2 sintering productivity tumbler strength low temperature breakdown index pulverized coal injection |
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