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光亮酸性镀铜的设备配置
引用本文:袁诗璞.光亮酸性镀铜的设备配置[J].涂装与电镀,2010(3):18-24,42.
作者姓名:袁诗璞
作者单位:成都市机投镇会所花园A3—02—202,四川成都610045
摘    要:电镀设备设施的完善和改进,往往能比单纯从对工艺镀液的调整、处理获得更好的效果。硫酸盐光亮酸性镀铜,由于工艺的某些特殊性,对此要求更高。本文结合不同体系光亮剂的工艺特点,进行了较为详细的讨论。连续过滤、镀液搅拌、液温过低时的恒温电加热、采用低纹波直流电源,是共同需要的;当液温超过工艺上限时,应根据多种因素来选择不同的降温措施。即使对宣称可不除膜的工艺,在工艺布局设计时,也宜设简单的化学除膜工序,以备不时之需。

关 键 词:设备配置  连续过滤  搅拌  恒温加热  降温  除膜

Equipment Dispostion of Bright Acid Copper Plating
Yuan Shipu.Equipment Dispostion of Bright Acid Copper Plating[J].Painting & Electroplating,2010(3):18-24,42.
Authors:Yuan Shipu
Affiliation:Yuan Shipu (Chengdu jiton town huisuo garden A3 -02 -202,Sichuan Chengdu,610045)
Abstract:This paper minutely discussed the equipment dispostion of bright acid copper plating on the basis of technology characteristics of distinct system brighteners.Continuous filter,solution mix,electric heating for constant temperature,direct current power,are common need.Selection of lower the temperature measure should on the basis many factors when solution temperature go beyond the upper limit.Simple discarding film process is need.
Keywords:equipment dispostion  continuous filter  mix  heating for constant temperature  lower the temperature  discarding film  
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