| AlN/W多层体共烧过程中的应力 |
| |
| 引用本文： | 梁彤翔,朱钧国,杨冰,张秉忠,彭新立,王英华,李恒德.AlN/W多层体共烧过程中的应力[J].硅酸盐学报,1998,26(3):286-291. |
| |
| 作者姓名： | 梁彤翔 朱钧国 杨冰 张秉忠 彭新立 王英华 李恒德 |
| |
| 作者单位： | 1. 清华大学核能技术设计研究院
2. 清华大学材料科学与工程系 |
| |
| 摘 要： | 研究了１８５０℃高温烧结ＡｌＮ／Ｗ多层体烧结应力状态和产生原因，结果表明ＡｌＮ与Ｗ在１８５０℃共烧时，不同阶段烧结应力状态有所不同，在升温阶段，Ｗ层受平面拉应力作用，Ｗ层烧结速率降低，导致表面Ｗ膜内存在的大量空洞，而内部Ｗ布线受到径向拉应力的作用，在保温阶段，与表面Ｗ焊盘接触的ＡｌＮ受到拉应力的作用，与内部Ｗ线接触的ＡｌＮ受到环向拉应力的作用，由于环向拉应力的存在，导致ＡｌＮ的烧结速度帮烧结密度显
|
| 关 键 词： | 应力 多层基板 电子封装 氮化铝陶瓷 烧结 |
SINTERING STRESSES IN CO_SINTERED AlN/W MULTILAYER SUBSTRATES |
| |
| Liang Tongxiang,Zhu Junguo,Yang Bing,Zhang Bingzhong,Peng Xinli,Wang Yinghua,Li Hengde.SINTERING STRESSES IN CO_SINTERED AlN/W MULTILAYER SUBSTRATES[J].Journal of The Chinese Ceramic Society,1998,26(3):286-291. |
| |
| Authors: | Liang Tongxiang Zhu Junguo Yang Bing Zhang Bingzhong Peng Xinli Wang Yinghua Li Hengde |
| |
| Abstract: | The states and the causes of sintering stress produced in AlN/W co_sintered multilayer substrates were studied. Stress states are different in two stages:in the sintering stage,in_plane stresses are developed in W film which leads to high porosity and reducation of sintering rate; in the soaking stage, radial stresses are developed in AlN near the AlN/W interface, which reduces the shrinkage rate and density of AlN ceramic. |
| |
| Keywords: | stress multilayer substrates electronic packaging AlN ceramic sintering |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
