| 氮化硅薄膜的制备技术 |
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| 引用本文： | 余京松,马青松,葛曼珍,杨辉,江仲华.氮化硅薄膜的制备技术[J].中国陶瓷工业,1999,6(1):20-22. |
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| 作者姓名： | 余京松 马青松 葛曼珍 杨辉 江仲华 |
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| 作者单位： | 浙江大学材料系,杭州,310027;浙江大学硅材料国家重点实验室 |
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| 基金项目： | 国家自然科学基金,浙江省自然科学基金 |
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| 摘 要： | 氮化硅薄膜是一种重要的精细陶瓷薄膜材料，具有优秀的光电性能、钝化性能、稳定性能和机械性能，在微电子、光电和材料表面改性等领域有着广阔的应用前景。本文综述了几种制备氮化硅薄膜的方法。
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| 关 键 词： | 氮化硅，薄膜，制备 |
PREPARATION METHODS OF SILICON NITRIDE THIN FIMS |
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| Yu Jingsong,Ma Qingsong,Ge Manhen,Yang Hui,Jiang Zhonghua.PREPARATION METHODS OF SILICON NITRIDE THIN FIMS[J].China Ceramic Industry,1999,6(1):20-22. |
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| Authors: | Yu Jingsong Ma Qingsong Ge Manhen Yang Hui Jiang Zhonghua |
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| Affiliation: | State Key Laboratory of Silicon Materials ScienceZhejiang
University |
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| Abstract: | Silicon Nitride thin films are important fine ceramic materials,they have
excellent photoelectric properties,stability,passivation and mechanical properties.They have wide
application prospects in the fields of microelectronics,optics,electricity and surface modification of
materials.In this paper,we review some methods of preparation of Silicon Nitride thin films and
point out the advantages and disadvantages of each method. |
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| Keywords: | Silicon Nitride thin films preparation |
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