| 克拉霉素合成中保护基的脱除反应研究 |
| |
| 引用本文： | 郑少军,白景瑞,姚国伟,庞思平,梁建华.克拉霉素合成中保护基的脱除反应研究[J].精细化工,2004,21(3):185-187. |
| |
| 作者姓名： | 郑少军 白景瑞 姚国伟 庞思平 梁建华 |
| |
| 作者单位： | 1. 北京理工大学,化工与环境学院,北京,100081
2. 北京理工大学,生命科学技术学院,北京,100081 |
| |
| 基金项目： | 国家经贸委技术创新项目(01BK-009) |
| |
| 摘 要： | 深入研究了克拉霉素合成中各保护基的脱除反应,发现2′ 和4″ 羟基上的三甲基硅保护基(TMS)和9 肟羟基上的醚化保护基(1 乙氧基环己基)的脱除是分步进行的,温度和pH是影响各个保护基脱除的主要因素。pH=4 6时,常温下反应1h可以脱去两个TMS保护基,而在升温回流的条件下反应0 5h才可以脱去醚化保护基。实验中还发现2′ 和4″ 羟基上的TMS保护基在同一反应条件下对不同的酸的敏感性是不同的。作者分离纯化了脱去各个保护基的反应中间体并进行了结构表征。
|
| 关 键 词： | 克拉霉素 肟 肟醚 脱保护 |
| 文章编号： | 1003-5214(2004)03-0185-03 |
Deprotective Reaction in the Synthesis of Clarithromycin |
| |
| ZHENG Shao-jun,BAI Jing-rui,YAO Guo-wei,PANG Si-ping,LIANG Jian-hua.Deprotective Reaction in the Synthesis of Clarithromycin[J].Fine Chemicals,2004,21(3):185-187. |
| |
| Authors: | ZHENG Shao-jun BAI Jing-rui YAO Guo-wei PANG Si-ping LIANG Jian-hua |
| |
| Affiliation: | ZHENG Shao-jun~1,BAI Jing-rui~1,YAO Guo-wei~2,PANG Si-ping~2,LIANG Jian-hua~2 |
| |
| Abstract: | In the synthesis of clarithromycin,the protective groups at 2′-,4″- and 9- position were removed step by step,in which the temperature and pH value were two main factors.It was found that the sensitivity of two TMS groups at 2′- and 4″-position under the same reaction conditions but with different acids was different.The intermediates produced during the deprotective reaction were separated and characterized by ~1H ~(13)C NMR and MS. |
| |
| Keywords: | clarithromycin oxime oxime-ether deprotection |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
