光化学AOPs去除水中抗生素抗性菌和抗性基因研究进展

抗生素的滥用所导致的细菌耐药性增强以及抗性基因污染问题,对人类健康和生态安全造成了极大的威胁,如何高效地去除水中抗生素抗性菌(简称ARB)和和抗生素抗性基因(简称ARGs)成为当前研究重点.光化学高级氧化技术(简称AOPs)可以利用光辐照产生具有强氧化性的活性氧物种来氧化分解水中难降解有机污染物,对于水中抗性菌和抗性基因的去除具有广阔的应用前景.该文首先介绍了抗生素抗性基因传播扩散机制及污染现状,其次对光化学AOPs应用于去除水中抗生素ARB和ARGs的研究进展进行归纳,并分析了影响去除效果的因素及其应用的局限性,最后指出未来应加强对于光化学AOPs灭活的氧化损伤机制以及与规模化实际工程应用相结合的研究.

Research progress on removal of antibiotic resistant bacteria and genes in water by photochemical AOPs

The increased resistance of bacteria and the pollution of resistant genes caused by the abuse of antibiotics pose a great threat to human health and ecological safety. How to efficiently remove antibiotic resistant bacteria(ARB) and antibiotic resistant genes(ARGs) in water has become the current research focus. Photochemical advanced oxidation processes (AOPs) can use light irradiation to generate active oxygen species with strong oxidizing properties to oxidize and decompose difficult-to-degrade organic pollutants in water. It has broad application prospects for the removal of resistant bacteria and resistant genes in water. This article firstly introduces the spreading mechanism of antibiotic resistance genes and the status of pollution. Secondly, it summarizes the research progress of photochemical AOPs in the removal of antibiotic-resistant bacteria and resistance genes in water, and analyzes the factors affecting the removal effect and its application. Limitations, and finally pointed out that in the future, the research on the oxidative damage mechanism of AOPs inactivation and the combination of large-scale practical engineering applications should be strengthened.