首页 | 本学科首页   官方微博 | 高级检索  
     

低苯酚和甲醛残留氨基磺酸系高效减水剂合成工艺
引用本文:蒋新元,邱学青.低苯酚和甲醛残留氨基磺酸系高效减水剂合成工艺[J].化学工程,2006,34(7):58-62.
作者姓名:蒋新元  邱学青
作者单位:1. 中南林学院,工业学院,湖南,长沙,410004
2. 华南理工大学,化工学院,广东,广州,510640
基金项目:广东省科技攻关项目资助(2002C1030305)
摘    要:研究了低苯酚和甲醛残留的氨基磺酸系高效减水剂(ASP)的合成工艺,通过IR和GPC研究了其结构、分子量及分布。结果表明:反应物配比、时间、pH值及温度等工艺参数影响产品的分散性能及残留苯酚和甲醛质量分数。氨基磺酸系高效减水剂的优化合成工艺条件为:n(对氨基苯磺酸钠)∶n(苯酚)∶n(甲醛)=(0.75—1.0)∶1∶(2.5—5.0),溶液pH值为8.5—11.4,反应时间2.0—3.5 h,反应温度为80—95℃。在此条件下合成的ASP中残留苯酚和甲醛质量分数远低于树脂类产品的国家标准。

关 键 词:氨基磺酸  高效减水剂  合成工艺  残留量
文章编号:1005-9954(2006)07-0058-05

Synthetic technology of aminosulfonic acid-based superplasticizer with low residual quantity of phenol and formaldehyde
JIANG Xin-yuan,QIU Xue-qing.Synthetic technology of aminosulfonic acid-based superplasticizer with low residual quantity of phenol and formaldehyde[J].Chemical Engineering,2006,34(7):58-62.
Authors:JIANG Xin-yuan  QIU Xue-qing
Affiliation:1. College of Technology, Central South Forestry University, Changsha 410004, Hunan Province, China; 2. College of Chemical Engineering, South China University of Technology, Guangzhou 510640, Guangdong Province, China
Abstract:The synthetic technology of aminosulfonic acid-based superplasticizer with low residual quantity of free phenol and formaldehyde was studied,and its structure,relative molecular mass and its distribution were also studied with IR and GPC.The results indicate that factors such as reactants ratio,time,temperature and pH affect the(dispersing) performance and the contents of free phenol and formaldehyde in ASP.The optimum synthetic conditions are as follows: the molar ratio of sodium sulfanilate,phenol and formaldehyde is(0.75-1.0) ∶ 1 ∶(2.5-5.0);the time is 2.0-3.5 h,and temperature is 80-95 ℃,and the pH value of solution is 8.5-11.4.The residual quantity of phenol and formaldehyde in ASP produced under the optimum conditions are far below the national standard of resin products.
Keywords:aminosulfonic acid  superplasticizer  synthetic technology  residual quantity
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号