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[ChCl-3EG]/CrCl3·6H2O离子液体中电沉积铬镀层的研究
引用本文:张志,李坚,华一新,王震,张远,柯平超.[ChCl-3EG]/CrCl3·6H2O离子液体中电沉积铬镀层的研究[J].昆明理工大学学报(理工版),2013(6):6-13.
作者姓名:张志  李坚  华一新  王震  张远  柯平超
作者单位:[1]昆明理工大学冶金与能源工程学院,云南昆明650093 [2]云南省复杂有色金属资源清洁利用国家重点实验室培育基地,云南昆明650093
基金项目:国家自然科学基金项目(51274108),云南省自然科学基金重点项目(2011FA009),昆明理工大学2009年科研基金项目(KKZ42007270HD3).
摘    要:以氯化胆碱(ChCl)、乙二醇(EG)和CrCl3·6H20制备的ChCl—3EG]/CrCl3·6H2O低共熔溶剂型离子液体为电解液,在镍基阴极上电沉积出黑铬镀层.采用冰点测定仪、旋转式黏度计、电导率仪分别测定了该离子液体的熔点、黏度和电导率,以线性扫描伏安法测得ChCl-3EG]离子液体的电化学窗口为3.22V.ChCl-3EG]/CrCl3·6H2O离子液体的循环伏安曲线表明Cr^3+的电化学还原经历Cr^3+→Cr^2+和Cr^2+→Cr^0两步还原反应,起始还原电位分别为-0.26V和-1.06V,且两步均为不完全可逆过程;以电流密度为20mA/cm。于50℃下进行恒电流电沉积30min,对阴极沉积物的XRD和XPS测试表明,镀层成分铬原子百分比为Cr80.94%、Cr20319.06%.sEM和AFM测试表明,在ChCl—3EG]/CrCl3·6H2O离子液体中可电沉积出平整、致密、无裂纹、表面粗糙度为5.56nm的黑铬镀层,电沉积铬的电流效率约为65.8%.

关 键 词:三价铬  离子液体  电沉积  氯化胆碱-乙二醇

The Study of Electrodeposition of Chromium Coating in [ ChCl-3EG]/CrCl3· 6H2O Ionic Liquid
ZHANG ZhiI,LI Jianl',HUA Yi-xin,',WANG Zhenl,ZHANG Yuanl,KE Ping-chao.The Study of Electrodeposition of Chromium Coating in [ ChCl-3EG]/CrCl3· 6H2O Ionic Liquid[J].Journal of Kunming University of Science and Technology(Natural Science Edition),2013(6):6-13.
Authors:ZHANG ZhiI  LI Jianl'  HUA Yi-xin    WANG Zhenl  ZHANG Yuanl  KE Ping-chao
Affiliation:1. Faculty of Metallurgical and Energy Engineering, Kunming University of Science and Technology, Kunming 650093,China; 2. State Key Laboratory Breeding Base of Complex Nonferrous Metal Resources Cleaning Utilization in Yunnan Province, Kunming 650093, China)
Abstract:Black chromium film is electrodeposited on the cathode of nickel substrates fi-om ionic liquids formed with Choline chloride and Ethylene Glycol containing CrC13· 6H2O. Cryoscope, rotational viscometer and con- ductivity meter are used to measure the inching points, viscosity and conductivity of the ionic liquids. The LSV test indicates the electrochemical windows of ChCl-3EG] ionic liquid is 3.22V. The cyclic vohammetry of ChC1-3EG]/CrC13 6H2O ionic liquid shows that the reduction of Cr3+ to Cr includes two-step irreversible processes, the first being Cr3 + to Cr: + , then Cr2 + to Cr+ , the initial reduction potentials of which are -0.26V and -1.06V respectively. The Component analysis of black chromium films deposited at 20 mA/cm: current den- sity and 50℃ for 30 minutes shows that the chromium atomic percentage are Cr 80.94% and Cr203 19.06% re- spectively. The SEM and AFM analysis indicate that chromium can be electrodeposited efficiently to yield a com- pact, smooth and crack-free deposit in ChC1-3EGJ/CrCl3· 6H:O ionic liquid.
Keywords:trivalent chromium  ionic liquid  electrodeposition  choline chloride-ethylene glycol
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