| 电子束曝光系统扫描场的畸变校正 |
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| 引用本文： | 王绍钧.电子束曝光系统扫描场的畸变校正[J].山东大学学报(工学版),1989(2). |
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| 作者姓名： | 王绍钧 |
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| 作者单位： | 山东工业大学电机工程系 |
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| 摘 要： | 根据平面区域变换的原理,导出电子束曝光机扫描场的畸变校正函数,并给出计算机模拟校正的结果。
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| 关 键 词： | 电子束加工 电子束光刻 集成电路 |
DISTORTION CORRECTION METHOD OF THE SCAN FIELD FOR E-BEAM EXPOSURE SYSTEM |
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| Wang Shaojun.DISTORTION CORRECTION METHOD OF THE SCAN FIELD FOR E-BEAM EXPOSURE SYSTEM[J].Journal of Shandong University of Technology,1989(2). |
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| Authors: | Wang Shaojun |
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| Affiliation: | Dept. of Elect. Eng. |
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| Abstract: | A scan field distortion correction function for e-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer. |
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| Keywords: | Electronic beam machining Electronic beam photoetching Integrated circuit(IC) |
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