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| 脉冲偏压对TiAlN/TiN多层膜生长及熔滴的影响 | |
| 引用本文： | 宫永辉,毛延发,唐卫国,刘金良,冯博学,韩培刚.脉冲偏压对TiAlN/TiN多层膜生长及熔滴的影响[J].深圳大学学报(理工版),2007,24(4):410-413. |
| 作者姓名： | 宫永辉 毛延发 唐卫国 刘金良 冯博学 韩培刚 |
| 作者单位： | 1. 深圳大学机电与控制工程学院,深圳,518060 2. 西安建筑科技大学冶金工程学院,西安,710055 3. 兰州大学物理科学与技术学院,兰州,730000 4. 深圳市广大纳米工程技术有限公司,深圳,518172 |
| 基金项目： | 深圳大学校科研和教改项目 |
| 摘 要： | 针对直流脉冲负偏压对PVD涂层形成过程和熔滴造成很大影响的问题,通过施加脉冲偏压有利于实现低温沉积.研究发现,沉积速率随直流脉冲负偏压峰值的提高先升高后降低,在-300V偏压时沉积速率最大;熔滴密度和直径随脉冲负偏压峰值的提高递减;随偏压升高,加大了元素溅射产额的差异,使涂层中铝元素和钛元素的含量发生变化. |
| 关 键 词： | 脉冲偏压 TiAlN/TiN膜 生长过程 熔滴 多弧离子镀 |
| 文章编号： | 1000-2618（2007）04-0410-04 |
| 修稿时间： | 2007-08-03 |
Influence of DC pulse-bias on growing processes and droplets of TiAlN/TiN coating |
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| GONG Yong-hui,MAO Yan-fa,TANG Wei-guo,LIU Jin-liang,FENG Bo-xue,HAN Pei-gang.Influence of DC pulse-bias on growing processes and droplets of TiAlN/TiN coating[J].Journal of Shenzhen University(Science &engineering),2007,24(4):410-413. | |
| Authors: | GONG Yong-hui MAO Yan-fa TANG Wei-guo LIU Jin-liang FENG Bo-xue HAN Pei-gang |
| Abstract: | Multi-arc ion plating is widely used to deposit hard coatings.The effect of the DC pulse-bias on the growing processes and the droplets is considerable.The research shows that the depositing rate increases at first and then decreases as the peak value of negative DC pulse-bias increases gradually.The maximum rate locates at-300 V.The density and diameter of droplets formed during the coatings growing become low and small when the pulse-bias increases.The ratio of titanium and aluminum in the coatings will change,and the low temperature deposition will become easy as the negative pulse-bias is employed. |
| Keywords: | DC pulse-bias TiAlN/TiN coating growing processes droplets multi-arc ion plating |
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